Cee 100 spin coater manual

 · The CEE is a Manual Photoresist Spin Coater. Set up for mm and mm round substrates. It has nearby softbake hotplate. Chemistry. This manual spinner is used to coat HPR Photoresist. This manual spinner is used to coat MIR Photoresist. SU8, Polyimide, and Spin on Glass may not be coated in this tool. moderate spin speed of about 25% of the high speed spin will generally suffice to aid in drying the film without significantly changing the film thickness. Each program on a Cee spin coater may contain up to ten separate process steps. While most spin processes require only two or three, this allows the maximum. Cost Effective Equipment spin coaters have been the benchmark for photoresist processing since the Cee® Model was introduced over 25 years ago. All of our high reliability spinners incorporate digital indirect spindle drive technology that eliminates the well-known chuck heating and motor reliability problems common in cheap spin coaters.

moderate spin speed of about 25% of the high speed spin will generally suffice to aid in drying the film without significantly changing the film thickness. Each program on a Cee spin coater may contain up to ten separate process steps. While most spin processes require only two or three, this allows the maximum. Brewer Science, Inc., Rolla, MO Subject: CB Operators’ Manual Cee® Division - Manufacturing Group Document Control #: MD Originator - Dave Wilson, Tech Doc Coordinator Effective Date: 09 Feb Brewer Science Model Spin Coater Operator Instructions 10/02 This machine is to be used by authorized personnel only. To obtain training on this instrument, please contact the Lab Manager directly (rm X/). If at any time during use unknown problems occur, stop all work immediately.

Programming and Running the Brewer Science CEE Spin Coater. INTRODUCTION: The spinner is a fairly sophisticated tool with precise control of: 1) spin. normal use and service in accordance with Cee instructions and specifications. The Cee spin coater system is designed to process round www.doorway.ru to. Home · Semi. Process · Resist Coat, Bake, Develop, Strip, Photostabilize · Coaters: Manual load · CEE wafer spin coater dual dispense nozzles, mm wafer chuck.